Electrochemical Deposition: Properties and Applications
The Special Issue contains topical papers on the latest research, development, and application of electrochemical deposition method. The method is based on the chemical reduction of metal ions or their complexes. It is an almost universal way of making material coatings on the surface of conductive...
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| Formato: | Online |
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| Idioma: | inglês |
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MDPI - Multidisciplinary Digital Publishing Institute
2024
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| Acesso em linha: | ONIX_20240514_9783725801930_192 |
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| _version_ | 1869525077434826752 |
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| collection | Directory of Open Access Books |
| description | The Special Issue contains topical papers on the latest research, development, and application of electrochemical deposition method. The method is based on the chemical reduction of metal ions or their complexes. It is an almost universal way of making material coatings on the surface of conductive substrates by electrolysis of aqueous solutions containing metal ions or complexes. Electrochemical deposition is an inexpensive and relatively fast method that can be applied on an industrial scale for nano- and micro-structured coatings over a large area.With deep respect, we dedicate this Special Issue to the memory of the distinguished scientist Assoc. Prof. Dr. Konstantin Lovchinov (Bulgarian Academy of Sciences), who was its initiator and the main Guest Editor. |
| format | Online |
| id | doab-20.500.12854ir-137592 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2024 |
| publishDateRange | 2024 |
| publishDateSort | 2024 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-1375922024-05-14T13:40:27Z Electrochemical Deposition: Properties and Applications Alexieva, Gergana electrochemical deposition surface morphology ZrO2 films optical measurement pulsed electrodeposition nanotubes nanodots porous template varicap device site-selective deposition delafossite CuFeO2 film galvanostatic electrodeposition deposition parameters morphological characteristic compositional characteristic chemical vapor deposition (CVD) ceramic composite coatings layer conditions deposition mechanism reaction kinetics electrodeposition Fe-W-P alloy hydrogen evolution pH soft magnetic electrophoretic deposition solid oxide fuel cell thin-film electrolyte coating MIEC electrolyte barrier layer doped Bi2O3 soot circle economy waste treatment super capacitors organic synthesis photovoltaics multinary chalcogenides thermal annealing Kesterite XRD electroless Ni-P electroless deposition microhardness annealing plating parameters electromagnetic interruption DC sputtering titanium conducting polymers PEDOT counterions electroanalysis thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues The Special Issue contains topical papers on the latest research, development, and application of electrochemical deposition method. The method is based on the chemical reduction of metal ions or their complexes. It is an almost universal way of making material coatings on the surface of conductive substrates by electrolysis of aqueous solutions containing metal ions or complexes. Electrochemical deposition is an inexpensive and relatively fast method that can be applied on an industrial scale for nano- and micro-structured coatings over a large area.With deep respect, we dedicate this Special Issue to the memory of the distinguished scientist Assoc. Prof. Dr. Konstantin Lovchinov (Bulgarian Academy of Sciences), who was its initiator and the main Guest Editor. 2024-05-14T13:40:20Z 2024-05-14T13:40:20Z 2024 book ONIX_20240514_9783725801930_192 9783725801930 9783725801947 https://directory.doabooks.org/handle/20.500.12854/137592 eng application/octet-stream Attribution-NonCommercial-NoDerivatives 4.0 International https://mdpi.com/books/pdfview/book/8778 https://mdpi.com/books/pdfview/book/8778 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-7258-0194-7 10.3390/books978-3-7258-0194-7 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783725801930 9783725801947 164 open access |
| spellingShingle | electrochemical deposition surface morphology ZrO2 films optical measurement pulsed electrodeposition nanotubes nanodots porous template varicap device site-selective deposition delafossite CuFeO2 film galvanostatic electrodeposition deposition parameters morphological characteristic compositional characteristic chemical vapor deposition (CVD) ceramic composite coatings layer conditions deposition mechanism reaction kinetics electrodeposition Fe-W-P alloy hydrogen evolution pH soft magnetic electrophoretic deposition solid oxide fuel cell thin-film electrolyte coating MIEC electrolyte barrier layer doped Bi2O3 soot circle economy waste treatment super capacitors organic synthesis photovoltaics multinary chalcogenides thermal annealing Kesterite XRD electroless Ni-P electroless deposition microhardness annealing plating parameters electromagnetic interruption DC sputtering titanium conducting polymers PEDOT counterions electroanalysis thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Electrochemical Deposition: Properties and Applications |
| title | Electrochemical Deposition: Properties and Applications |
| title_full | Electrochemical Deposition: Properties and Applications |
| title_fullStr | Electrochemical Deposition: Properties and Applications |
| title_full_unstemmed | Electrochemical Deposition: Properties and Applications |
| title_short | Electrochemical Deposition: Properties and Applications |
| title_sort | electrochemical deposition properties and applications |
| topic | electrochemical deposition surface morphology ZrO2 films optical measurement pulsed electrodeposition nanotubes nanodots porous template varicap device site-selective deposition delafossite CuFeO2 film galvanostatic electrodeposition deposition parameters morphological characteristic compositional characteristic chemical vapor deposition (CVD) ceramic composite coatings layer conditions deposition mechanism reaction kinetics electrodeposition Fe-W-P alloy hydrogen evolution pH soft magnetic electrophoretic deposition solid oxide fuel cell thin-film electrolyte coating MIEC electrolyte barrier layer doped Bi2O3 soot circle economy waste treatment super capacitors organic synthesis photovoltaics multinary chalcogenides thermal annealing Kesterite XRD electroless Ni-P electroless deposition microhardness annealing plating parameters electromagnetic interruption DC sputtering titanium conducting polymers PEDOT counterions electroanalysis thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | electrochemical deposition surface morphology ZrO2 films optical measurement pulsed electrodeposition nanotubes nanodots porous template varicap device site-selective deposition delafossite CuFeO2 film galvanostatic electrodeposition deposition parameters morphological characteristic compositional characteristic chemical vapor deposition (CVD) ceramic composite coatings layer conditions deposition mechanism reaction kinetics electrodeposition Fe-W-P alloy hydrogen evolution pH soft magnetic electrophoretic deposition solid oxide fuel cell thin-film electrolyte coating MIEC electrolyte barrier layer doped Bi2O3 soot circle economy waste treatment super capacitors organic synthesis photovoltaics multinary chalcogenides thermal annealing Kesterite XRD electroless Ni-P electroless deposition microhardness annealing plating parameters electromagnetic interruption DC sputtering titanium conducting polymers PEDOT counterions electroanalysis thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20240514_9783725801930_192 |