Current Research in Thin Film Deposition
Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of...
সংরক্ষণ করুন:
| বিন্যাস: | Online |
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| ভাষা: | ইংরেজি |
| প্রকাশিত: |
MDPI - Multidisciplinary Digital Publishing Institute
2022
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| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | ONIX_20220111_9783036505121_111 |
| ট্যাগগুলো: |
কোনো ট্যাগ নেই, প্রথমজন হিসাবে ট্যাগ করুন!
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| _version_ | 1869513877176188928 |
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| collection | Directory of Open Access Books |
| description | Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology. |
| format | Online |
| id | doab-20.500.12854ir-76375 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2022 |
| publishDateRange | 2022 |
| publishDateSort | 2022 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-763752024-04-09T23:16:17Z Current Research in Thin Film Deposition Birney, Ross PECVD plasma diagnostics nc-Si:H RF-PECVD Fourier-transform infrared spectroscopy (FTIR) quadruple mass spectrometry (QMS) optical emission spectroscopy (OES) X-ray diffraction spectroscopy (XRD) micro hollow glass spheres (MHGS) solid micro glass spheres (SMGS) liquid phase deposition (LPD) aluminum coating β-Ga2O3 MOCVD VI/III ratio scandium stabilized zirconia thin films e-beam physical vapor deposition thin films ceramics Raman spectroscopy X-ray diffraction initiated chemical vapor deposition (iCVD) superhydrophobic fluoropolymer thin film atomic layer deposition nanomechanics Young’s modulus shear modulus resonant frequency Q-factor microcantilevers internal stress nickel–chromium thin film thermocouples physical vapor deposition flat film extrusion foil quality MgF2 color center absorption density crystal frequency stress adhesion polarization controlling dual functional-metalens focusing splitting PVD coatings nanoindentation brittle cracking fracture toughness diamond coatings residual stresses interfacial fatigue strength annealing milling n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology. 2022-01-11T13:30:17Z 2022-01-11T13:30:17Z 2021 book ONIX_20220111_9783036505121_111 9783036505121 9783036505138 https://directory.doabooks.org/handle/20.500.12854/76375 eng image/jpeg Attribution 4.0 International https://mdpi.com/books/pdfview/book/3800 https://mdpi.com/books/pdfview/book/3800 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-0365-0513-8 10.3390/books978-3-0365-0513-8 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783036505121 9783036505138 154 Basel, Switzerland open access |
| spellingShingle | PECVD plasma diagnostics nc-Si:H RF-PECVD Fourier-transform infrared spectroscopy (FTIR) quadruple mass spectrometry (QMS) optical emission spectroscopy (OES) X-ray diffraction spectroscopy (XRD) micro hollow glass spheres (MHGS) solid micro glass spheres (SMGS) liquid phase deposition (LPD) aluminum coating β-Ga2O3 MOCVD VI/III ratio scandium stabilized zirconia thin films e-beam physical vapor deposition thin films ceramics Raman spectroscopy X-ray diffraction initiated chemical vapor deposition (iCVD) superhydrophobic fluoropolymer thin film atomic layer deposition nanomechanics Young’s modulus shear modulus resonant frequency Q-factor microcantilevers internal stress nickel–chromium thin film thermocouples physical vapor deposition flat film extrusion foil quality MgF2 color center absorption density crystal frequency stress adhesion polarization controlling dual functional-metalens focusing splitting PVD coatings nanoindentation brittle cracking fracture toughness diamond coatings residual stresses interfacial fatigue strength annealing milling n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Current Research in Thin Film Deposition |
| title | Current Research in Thin Film Deposition |
| title_full | Current Research in Thin Film Deposition |
| title_fullStr | Current Research in Thin Film Deposition |
| title_full_unstemmed | Current Research in Thin Film Deposition |
| title_short | Current Research in Thin Film Deposition |
| title_sort | current research in thin film deposition |
| topic | PECVD plasma diagnostics nc-Si:H RF-PECVD Fourier-transform infrared spectroscopy (FTIR) quadruple mass spectrometry (QMS) optical emission spectroscopy (OES) X-ray diffraction spectroscopy (XRD) micro hollow glass spheres (MHGS) solid micro glass spheres (SMGS) liquid phase deposition (LPD) aluminum coating β-Ga2O3 MOCVD VI/III ratio scandium stabilized zirconia thin films e-beam physical vapor deposition thin films ceramics Raman spectroscopy X-ray diffraction initiated chemical vapor deposition (iCVD) superhydrophobic fluoropolymer thin film atomic layer deposition nanomechanics Young’s modulus shear modulus resonant frequency Q-factor microcantilevers internal stress nickel–chromium thin film thermocouples physical vapor deposition flat film extrusion foil quality MgF2 color center absorption density crystal frequency stress adhesion polarization controlling dual functional-metalens focusing splitting PVD coatings nanoindentation brittle cracking fracture toughness diamond coatings residual stresses interfacial fatigue strength annealing milling n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | PECVD plasma diagnostics nc-Si:H RF-PECVD Fourier-transform infrared spectroscopy (FTIR) quadruple mass spectrometry (QMS) optical emission spectroscopy (OES) X-ray diffraction spectroscopy (XRD) micro hollow glass spheres (MHGS) solid micro glass spheres (SMGS) liquid phase deposition (LPD) aluminum coating β-Ga2O3 MOCVD VI/III ratio scandium stabilized zirconia thin films e-beam physical vapor deposition thin films ceramics Raman spectroscopy X-ray diffraction initiated chemical vapor deposition (iCVD) superhydrophobic fluoropolymer thin film atomic layer deposition nanomechanics Young’s modulus shear modulus resonant frequency Q-factor microcantilevers internal stress nickel–chromium thin film thermocouples physical vapor deposition flat film extrusion foil quality MgF2 color center absorption density crystal frequency stress adhesion polarization controlling dual functional-metalens focusing splitting PVD coatings nanoindentation brittle cracking fracture toughness diamond coatings residual stresses interfacial fatigue strength annealing milling n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20220111_9783036505121_111 |