Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc
This Special Issue “Characterization of Nanomaterials” collects nine selected papers presented at the 6th Dresden Nanoanalysis Symposium, held at Fraunhofer Institute for Ceramic Technologies and Systems in Dresden, Germany, on 31 August 2018. Following the specific motto of this annual symposium “M...
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| Μορφή: | Online |
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| Γλώσσα: | Αγγλικά |
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MDPI - Multidisciplinary Digital Publishing Institute
2022
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| Διαθέσιμο Online: | ONIX_20220111_9783036507569_512 |
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| collection | Directory of Open Access Books |
| description | This Special Issue “Characterization of Nanomaterials” collects nine selected papers presented at the 6th Dresden Nanoanalysis Symposium, held at Fraunhofer Institute for Ceramic Technologies and Systems in Dresden, Germany, on 31 August 2018. Following the specific motto of this annual symposium “Materials challenges—Micro- and nanoscale characterization”, it covered various topics of nanoscale materials characterization along the whole value and innovation chain, from fundamental research up to industrial applications. The scope of this Special Issue is to provide an overview of the current status, recent developments and research activities in the field of nanoscale materials characterization, with a particular emphasis on future scenarios. Primarily, analytical techniques for the characterization of thin films and nanostructures are discussed, including modeling and simulation. We anticipate that this Special Issue will be accessible to a wide audience, as it explores not only methodical aspects of nanoscale materials characterization, but also materials synthesis, fabrication of devices and applications. |
| format | Online |
| id | doab-20.500.12854ir-76777 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2022 |
| publishDateRange | 2022 |
| publishDateSort | 2022 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-767772024-04-09T23:15:46Z Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc Zschech, Ehrenfried Sinclair, Robert Martins, Rodrigo Sebastiani, Marco Sartori, Sabrina physical vapor deposition magnetron sputtering AlN/Al coating silicon substrate residual stresses wafer curvature method nanoscale residual stress profiling indentation failure modes nanoindentation adhesion intermetallic phases growth kinetics Al–Ni system zinc oxide nanoparticles paper transistors printed electronics electrolyte-gated transistors microwave synthesis oxide dissociation doping rare earth ions upconversion liquid alloys 2D materials thin films Ga–Sn–Zn alloys gallium alloys nanoanalysis lithium-ion nickel–manganese–cobalt oxide (NMC) leaching recycling recover degradation SEM-EDX Raman spectroscopy resistive switching memories multi-level cell copper oxide grain boundaries aluminum oxide p-type TFT p-type oxide semiconductors SnO electrical properties oxide structure analysis ToF-SIMS 3D imaging compositional depth profiling high aspect ratio (HAR) structures silicon doped hafnium oxide (HSO) ALD deposition lateral high aspect ratio (LHAR) ToF-SIMS analysis n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues This Special Issue “Characterization of Nanomaterials” collects nine selected papers presented at the 6th Dresden Nanoanalysis Symposium, held at Fraunhofer Institute for Ceramic Technologies and Systems in Dresden, Germany, on 31 August 2018. Following the specific motto of this annual symposium “Materials challenges—Micro- and nanoscale characterization”, it covered various topics of nanoscale materials characterization along the whole value and innovation chain, from fundamental research up to industrial applications. The scope of this Special Issue is to provide an overview of the current status, recent developments and research activities in the field of nanoscale materials characterization, with a particular emphasis on future scenarios. Primarily, analytical techniques for the characterization of thin films and nanostructures are discussed, including modeling and simulation. We anticipate that this Special Issue will be accessible to a wide audience, as it explores not only methodical aspects of nanoscale materials characterization, but also materials synthesis, fabrication of devices and applications. 2022-01-11T13:41:58Z 2022-01-11T13:41:58Z 2021 book ONIX_20220111_9783036507569_512 9783036507569 9783036507576 https://directory.doabooks.org/handle/20.500.12854/76777 eng image/jpeg Attribution 4.0 International https://mdpi.com/books/pdfview/book/4226 https://mdpi.com/books/pdfview/book/4226 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-0365-0757-6 10.3390/books978-3-0365-0757-6 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783036507569 9783036507576 139 Basel, Switzerland open access |
| spellingShingle | physical vapor deposition magnetron sputtering AlN/Al coating silicon substrate residual stresses wafer curvature method nanoscale residual stress profiling indentation failure modes nanoindentation adhesion intermetallic phases growth kinetics Al–Ni system zinc oxide nanoparticles paper transistors printed electronics electrolyte-gated transistors microwave synthesis oxide dissociation doping rare earth ions upconversion liquid alloys 2D materials thin films Ga–Sn–Zn alloys gallium alloys nanoanalysis lithium-ion nickel–manganese–cobalt oxide (NMC) leaching recycling recover degradation SEM-EDX Raman spectroscopy resistive switching memories multi-level cell copper oxide grain boundaries aluminum oxide p-type TFT p-type oxide semiconductors SnO electrical properties oxide structure analysis ToF-SIMS 3D imaging compositional depth profiling high aspect ratio (HAR) structures silicon doped hafnium oxide (HSO) ALD deposition lateral high aspect ratio (LHAR) ToF-SIMS analysis n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc |
| title | Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc |
| title_full | Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc |
| title_fullStr | Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc |
| title_full_unstemmed | Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc |
| title_short | Characterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc |
| title_sort | characterization of nanomaterials selected papers from 6th dresden nanoanalysis symposiumc |
| topic | physical vapor deposition magnetron sputtering AlN/Al coating silicon substrate residual stresses wafer curvature method nanoscale residual stress profiling indentation failure modes nanoindentation adhesion intermetallic phases growth kinetics Al–Ni system zinc oxide nanoparticles paper transistors printed electronics electrolyte-gated transistors microwave synthesis oxide dissociation doping rare earth ions upconversion liquid alloys 2D materials thin films Ga–Sn–Zn alloys gallium alloys nanoanalysis lithium-ion nickel–manganese–cobalt oxide (NMC) leaching recycling recover degradation SEM-EDX Raman spectroscopy resistive switching memories multi-level cell copper oxide grain boundaries aluminum oxide p-type TFT p-type oxide semiconductors SnO electrical properties oxide structure analysis ToF-SIMS 3D imaging compositional depth profiling high aspect ratio (HAR) structures silicon doped hafnium oxide (HSO) ALD deposition lateral high aspect ratio (LHAR) ToF-SIMS analysis n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | physical vapor deposition magnetron sputtering AlN/Al coating silicon substrate residual stresses wafer curvature method nanoscale residual stress profiling indentation failure modes nanoindentation adhesion intermetallic phases growth kinetics Al–Ni system zinc oxide nanoparticles paper transistors printed electronics electrolyte-gated transistors microwave synthesis oxide dissociation doping rare earth ions upconversion liquid alloys 2D materials thin films Ga–Sn–Zn alloys gallium alloys nanoanalysis lithium-ion nickel–manganese–cobalt oxide (NMC) leaching recycling recover degradation SEM-EDX Raman spectroscopy resistive switching memories multi-level cell copper oxide grain boundaries aluminum oxide p-type TFT p-type oxide semiconductors SnO electrical properties oxide structure analysis ToF-SIMS 3D imaging compositional depth profiling high aspect ratio (HAR) structures silicon doped hafnium oxide (HSO) ALD deposition lateral high aspect ratio (LHAR) ToF-SIMS analysis n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20220111_9783036507569_512 |