Nanoscale Self-Assembly: Nanopatterning and Metrology
The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epita...
Furkejuvvon:
| Materiálatiipa: | Online |
|---|---|
| Giella: | eaŋgalasgiella |
| Almmustuhtton: |
MDPI - Multidisciplinary Digital Publishing Institute
2022
|
| Fáttát: | |
| Liŋkkat: | ONIX_20220111_9783036519616_834 |
| Fáddágilkorat: |
Eai fáddágilkorat, Lasit vuosttaš fáddágilkora!
|
| _version_ | 1869521358507999232 |
|---|---|
| collection | Directory of Open Access Books |
| description | The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed. |
| format | Online |
| id | doab-20.500.12854ir-77002 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2022 |
| publishDateRange | 2022 |
| publishDateSort | 2022 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-770022024-04-09T23:16:41Z Nanoscale Self-Assembly: Nanopatterning and Metrology Ferrarese Lupi, Federico block copolymer self-assembly analytical ultracentrifugation tannic acid 3D printing nano-resolution arbitrary distribution multimaterials deposition surface rapidity large scale conjugated polymers polyfullerenes processing by convective self-assembly thin films and microstructure photoluminescence quenching block copolymers self-assembly polymer interface nanostructure metrology line edge roughness LER (S)TEM STEM-EELS of PS and PMMA directed self-assembly nanospheres lithography colloidal nanospheres direct laser-writing directed self-assembly (DSA) block copolymers (BCPs) chemo-epitaxy polystyrene-block-polymethylmethacrylate (PS-b-PMMA) line/space patterning line edge roughness (LER) line width roughness (LWR) sequential infiltration synthesis block copolymer nanoparticles colloidal clusters colloidal molecules sedimentation separation classification of nanoparticles analytical centrifugation differential centrifugal sedimentation disk centrifuge density gradient centrifugation thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed. 2022-01-11T13:48:55Z 2022-01-11T13:48:55Z 2021 book ONIX_20220111_9783036519616_834 9783036519616 9783036519609 https://directory.doabooks.org/handle/20.500.12854/77002 eng image/jpeg Attribution 4.0 International https://mdpi.com/books/pdfview/book/4612 https://mdpi.com/books/pdfview/book/4612 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-0365-1960-9 10.3390/books978-3-0365-1960-9 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783036519616 9783036519609 124 Basel, Switzerland open access |
| spellingShingle | block copolymer self-assembly analytical ultracentrifugation tannic acid 3D printing nano-resolution arbitrary distribution multimaterials deposition surface rapidity large scale conjugated polymers polyfullerenes processing by convective self-assembly thin films and microstructure photoluminescence quenching block copolymers self-assembly polymer interface nanostructure metrology line edge roughness LER (S)TEM STEM-EELS of PS and PMMA directed self-assembly nanospheres lithography colloidal nanospheres direct laser-writing directed self-assembly (DSA) block copolymers (BCPs) chemo-epitaxy polystyrene-block-polymethylmethacrylate (PS-b-PMMA) line/space patterning line edge roughness (LER) line width roughness (LWR) sequential infiltration synthesis block copolymer nanoparticles colloidal clusters colloidal molecules sedimentation separation classification of nanoparticles analytical centrifugation differential centrifugal sedimentation disk centrifuge density gradient centrifugation thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_full | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_fullStr | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_full_unstemmed | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_short | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_sort | nanoscale self assembly nanopatterning and metrology |
| topic | block copolymer self-assembly analytical ultracentrifugation tannic acid 3D printing nano-resolution arbitrary distribution multimaterials deposition surface rapidity large scale conjugated polymers polyfullerenes processing by convective self-assembly thin films and microstructure photoluminescence quenching block copolymers self-assembly polymer interface nanostructure metrology line edge roughness LER (S)TEM STEM-EELS of PS and PMMA directed self-assembly nanospheres lithography colloidal nanospheres direct laser-writing directed self-assembly (DSA) block copolymers (BCPs) chemo-epitaxy polystyrene-block-polymethylmethacrylate (PS-b-PMMA) line/space patterning line edge roughness (LER) line width roughness (LWR) sequential infiltration synthesis block copolymer nanoparticles colloidal clusters colloidal molecules sedimentation separation classification of nanoparticles analytical centrifugation differential centrifugal sedimentation disk centrifuge density gradient centrifugation thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | block copolymer self-assembly analytical ultracentrifugation tannic acid 3D printing nano-resolution arbitrary distribution multimaterials deposition surface rapidity large scale conjugated polymers polyfullerenes processing by convective self-assembly thin films and microstructure photoluminescence quenching block copolymers self-assembly polymer interface nanostructure metrology line edge roughness LER (S)TEM STEM-EELS of PS and PMMA directed self-assembly nanospheres lithography colloidal nanospheres direct laser-writing directed self-assembly (DSA) block copolymers (BCPs) chemo-epitaxy polystyrene-block-polymethylmethacrylate (PS-b-PMMA) line/space patterning line edge roughness (LER) line width roughness (LWR) sequential infiltration synthesis block copolymer nanoparticles colloidal clusters colloidal molecules sedimentation separation classification of nanoparticles analytical centrifugation differential centrifugal sedimentation disk centrifuge density gradient centrifugation thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20220111_9783036519616_834 |