Chemical Vapor Deposition for Nanotechnology

Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the...

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Kieli:englanti
Julkaistu: IntechOpen 2023
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Linkit:ONIX_20231201_9781789849615_1814
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collection Directory of Open Access Books
description Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
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spelling doab-20.500.12854ir-1307052024-04-11T20:34:47Z Chemical Vapor Deposition for Nanotechnology Mandracci, Pietro graphene, thin films, polymers, plasma, evaporation, growth mechanism thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials science Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book. 2023-12-01T18:08:19Z 2023-12-01T18:08:19Z 2019 book ONIX_20231201_9781789849615_1814 9781789849615 9781789849608 9781838817329 https://directory.doabooks.org/handle/20.500.12854/130705 eng image/jpeg n/a https://www.intechopen.com/books/6833 https://mts.intechopen.com/storage/books/6833/authors_book/authors_book.pdf IntechOpen IntechOpen 10.5772/intechopen.73342 10.5772/intechopen.73342 78a36484-2c0c-47cb-ad67-2b9f5cd4a8f6 9781789849615 9781789849608 9781838817329 IntechOpen 164 open access
spellingShingle graphene, thin films, polymers, plasma, evaporation, growth mechanism
thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials science
Chemical Vapor Deposition for Nanotechnology
title Chemical Vapor Deposition for Nanotechnology
title_full Chemical Vapor Deposition for Nanotechnology
title_fullStr Chemical Vapor Deposition for Nanotechnology
title_full_unstemmed Chemical Vapor Deposition for Nanotechnology
title_short Chemical Vapor Deposition for Nanotechnology
title_sort chemical vapor deposition for nanotechnology
topic graphene, thin films, polymers, plasma, evaporation, growth mechanism
thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials science
topic_facet graphene, thin films, polymers, plasma, evaporation, growth mechanism
thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials science
url ONIX_20231201_9781789849615_1814