Advances in Thin Film Fabrication by Magnetron Sputtering
Magnetron sputtering technology is one of the most popular PVD methods used in the industry. Its importance is predicted to increase due to the current developments in research centers engaged in that particular domain. Developments are due to the modifications introduced into the sputtering technol...
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| Formato: | Online |
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| Lenguaje: | inglés |
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MDPI - Multidisciplinary Digital Publishing Institute
2024
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| Acceso en línea: | ONIX_20240514_9783725806072_329 |
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| description | Magnetron sputtering technology is one of the most popular PVD methods used in the industry. Its importance is predicted to increase due to the current developments in research centers engaged in that particular domain. Developments are due to the modifications introduced into the sputtering technology itself (e.g., the use of innovative plasma sources, innovative technical means for influencing the state of the magnetron plasma, innovative approaches to the plasma’s state and its control) and the production of new coating materials with functional properties that enable them to meet the needs of the modern industry. This reprint aims to present a collection of ideas describing recent advances in thin-film manufacturing technology, focusing on the influence of magnetron sputtering modification on the film synthesis conditions, parameters, and properties of the films that are produced. |
| format | Online |
| id | doab-20.500.12854ir-137733 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2024 |
| publishDateRange | 2024 |
| publishDateSort | 2024 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-1377332024-05-14T14:17:19Z Advances in Thin Film Fabrication by Magnetron Sputtering Chodun, Rafal CuGa2O4 cubic spinel annealing studies optical characteristics XRD electrical characteristics Fe3Si film facing targets sputtering wettability mechanical property plasma treatment Cu2In2O5 RF sputtering morphology studies optical bandgap textured silicon aluminum-doped zinc oxide solar cells diffusion barrier thermal stability ferromagnetic target sputtering nickel sputtering hot sputtering hot target nickel coatings gas injection magnetron sputtering GIMS magnetron sputtering TC4 titanium alloy micro arc oxidation HEA film microstructure and properties sputtering thin film ScAlN ferroelectrics titanium nitride DC/RF magnetron-sputtering saturable absorber materials Q-switched fiber lasers fiber micro-ball lens no-core fiber lossy mode resonance fiber refractometers transparent oxide semiconductor copper-titanium mixed oxides p-type semiconductors optical and electrical properties gas sensor cross section preparation techniques SEM FIB/Ga PFIB/Xe thin-film materials multilayer DC magnetron sputtering particle-in-cell simulation oxide thin films TiOx (Ti,Co)Ox CoOx cobalt gas impulse magnetron sputtering semitransparent amorphous coatings thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Magnetron sputtering technology is one of the most popular PVD methods used in the industry. Its importance is predicted to increase due to the current developments in research centers engaged in that particular domain. Developments are due to the modifications introduced into the sputtering technology itself (e.g., the use of innovative plasma sources, innovative technical means for influencing the state of the magnetron plasma, innovative approaches to the plasma’s state and its control) and the production of new coating materials with functional properties that enable them to meet the needs of the modern industry. This reprint aims to present a collection of ideas describing recent advances in thin-film manufacturing technology, focusing on the influence of magnetron sputtering modification on the film synthesis conditions, parameters, and properties of the films that are produced. 2024-05-14T14:17:14Z 2024-05-14T14:17:14Z 2024 book ONIX_20240514_9783725806072_329 9783725806072 9783725806089 https://directory.doabooks.org/handle/20.500.12854/137733 eng application/octet-stream Attribution-NonCommercial-NoDerivatives 4.0 International https://mdpi.com/books/pdfview/book/8962 https://mdpi.com/books/pdfview/book/8962 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-7258-0608-9 10.3390/books978-3-7258-0608-9 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783725806072 9783725806089 188 open access |
| spellingShingle | CuGa2O4 cubic spinel annealing studies optical characteristics XRD electrical characteristics Fe3Si film facing targets sputtering wettability mechanical property plasma treatment Cu2In2O5 RF sputtering morphology studies optical bandgap textured silicon aluminum-doped zinc oxide solar cells diffusion barrier thermal stability ferromagnetic target sputtering nickel sputtering hot sputtering hot target nickel coatings gas injection magnetron sputtering GIMS magnetron sputtering TC4 titanium alloy micro arc oxidation HEA film microstructure and properties sputtering thin film ScAlN ferroelectrics titanium nitride DC/RF magnetron-sputtering saturable absorber materials Q-switched fiber lasers fiber micro-ball lens no-core fiber lossy mode resonance fiber refractometers transparent oxide semiconductor copper-titanium mixed oxides p-type semiconductors optical and electrical properties gas sensor cross section preparation techniques SEM FIB/Ga PFIB/Xe thin-film materials multilayer DC magnetron sputtering particle-in-cell simulation oxide thin films TiOx (Ti,Co)Ox CoOx cobalt gas impulse magnetron sputtering semitransparent amorphous coatings thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Advances in Thin Film Fabrication by Magnetron Sputtering |
| title | Advances in Thin Film Fabrication by Magnetron Sputtering |
| title_full | Advances in Thin Film Fabrication by Magnetron Sputtering |
| title_fullStr | Advances in Thin Film Fabrication by Magnetron Sputtering |
| title_full_unstemmed | Advances in Thin Film Fabrication by Magnetron Sputtering |
| title_short | Advances in Thin Film Fabrication by Magnetron Sputtering |
| title_sort | advances in thin film fabrication by magnetron sputtering |
| topic | CuGa2O4 cubic spinel annealing studies optical characteristics XRD electrical characteristics Fe3Si film facing targets sputtering wettability mechanical property plasma treatment Cu2In2O5 RF sputtering morphology studies optical bandgap textured silicon aluminum-doped zinc oxide solar cells diffusion barrier thermal stability ferromagnetic target sputtering nickel sputtering hot sputtering hot target nickel coatings gas injection magnetron sputtering GIMS magnetron sputtering TC4 titanium alloy micro arc oxidation HEA film microstructure and properties sputtering thin film ScAlN ferroelectrics titanium nitride DC/RF magnetron-sputtering saturable absorber materials Q-switched fiber lasers fiber micro-ball lens no-core fiber lossy mode resonance fiber refractometers transparent oxide semiconductor copper-titanium mixed oxides p-type semiconductors optical and electrical properties gas sensor cross section preparation techniques SEM FIB/Ga PFIB/Xe thin-film materials multilayer DC magnetron sputtering particle-in-cell simulation oxide thin films TiOx (Ti,Co)Ox CoOx cobalt gas impulse magnetron sputtering semitransparent amorphous coatings thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | CuGa2O4 cubic spinel annealing studies optical characteristics XRD electrical characteristics Fe3Si film facing targets sputtering wettability mechanical property plasma treatment Cu2In2O5 RF sputtering morphology studies optical bandgap textured silicon aluminum-doped zinc oxide solar cells diffusion barrier thermal stability ferromagnetic target sputtering nickel sputtering hot sputtering hot target nickel coatings gas injection magnetron sputtering GIMS magnetron sputtering TC4 titanium alloy micro arc oxidation HEA film microstructure and properties sputtering thin film ScAlN ferroelectrics titanium nitride DC/RF magnetron-sputtering saturable absorber materials Q-switched fiber lasers fiber micro-ball lens no-core fiber lossy mode resonance fiber refractometers transparent oxide semiconductor copper-titanium mixed oxides p-type semiconductors optical and electrical properties gas sensor cross section preparation techniques SEM FIB/Ga PFIB/Xe thin-film materials multilayer DC magnetron sputtering particle-in-cell simulation oxide thin films TiOx (Ti,Co)Ox CoOx cobalt gas impulse magnetron sputtering semitransparent amorphous coatings thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20240514_9783725806072_329 |