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Advances in Thin Film Fabrication by Magnetron Sputtering

Magnetron sputtering technology is one of the most popular PVD methods used in the industry. Its importance is predicted to increase due to the current developments in research centers engaged in that particular domain. Developments are due to the modifications introduced into the sputtering technol...

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Materialtyp: Online
Språk:engelska
Utgiven: MDPI - Multidisciplinary Digital Publishing Institute 2024
Ämnen:
CuGa2O4
cubic spinel
annealing studies
optical characteristics
XRD
electrical characteristics
Fe3Si film
facing targets sputtering
wettability
mechanical property
plasma treatment
Cu2In2O5
RF sputtering
morphology studies
optical bandgap
textured silicon
aluminum-doped zinc oxide
solar cells
diffusion barrier
thermal stability
ferromagnetic target sputtering
nickel sputtering
hot sputtering
hot target
nickel coatings
gas injection magnetron sputtering
GIMS
magnetron sputtering
TC4 titanium alloy
micro arc oxidation
HEA film
microstructure and properties
sputtering
thin film
ScAlN
ferroelectrics
titanium nitride
DC/RF magnetron-sputtering
saturable absorber materials
Q-switched fiber lasers
fiber micro-ball lens
no-core fiber
lossy mode resonance
fiber refractometers
transparent oxide semiconductor
copper-titanium mixed oxides
p-type semiconductors
optical and electrical properties
gas sensor
cross section
preparation techniques
SEM
FIB/Ga
PFIB/Xe
thin-film materials
multilayer
DC magnetron sputtering
particle-in-cell simulation
oxide thin films
TiOx
(Ti,Co)Ox
CoOx
cobalt
gas impulse magnetron sputtering
semitransparent
amorphous coatings
thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues
Länkar:ONIX_20240514_9783725806072_329
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