Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...
Gespeichert in:
| Format: | Online |
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| Sprache: | Englisch |
| Veröffentlicht: |
MDPI - Multidisciplinary Digital Publishing Institute
2021
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| Schlagworte: | |
| Online-Zugang: | ONIX_20210501_9783039438457_35 |
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