Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...
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| Format: | Online |
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| Language: | English |
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MDPI - Multidisciplinary Digital Publishing Institute
2021
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| Online Access: | ONIX_20210501_9783039438457_35 |
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| description | Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. |
| format | Online |
| id | doab-20.500.12854ir-68292 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2021 |
| publishDateRange | 2021 |
| publishDateSort | 2021 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-682922024-04-11T15:10:23Z Micro- and Nano-Fabrication by Metal Assisted Chemical Etching Romano, Lucia porous silicon Pd nanoparticles-assisted chemical etching etching rate ethanol electrooxidation X-ray diffractive optics zone plate high aspect ratio nanostructures metal-assisted chemical etching electroless deposition Al2O3 nanotube ultra-high aspect ratio gold (Au) metal assisted chemical etching atomic layer deposition anisotropic dry etching silicon cones metal assisted chemical etching transversal pores antireflection black GaAs photon recycling X-ray grating interferometry catalyst silicon gold electroplating magnetically guided metal-assisted chemical etching bulk Si etching curved Si structure catalyst encapsulation n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technology Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. 2021-05-01T15:06:19Z 2021-05-01T15:06:19Z 2021 book ONIX_20210501_9783039438457_35 9783039438457 9783039438464 https://directory.doabooks.org/handle/20.500.12854/68292 eng application/octet-stream Attribution 4.0 International https://mdpi.com/books/pdfview/book/3301 https://mdpi.com/books/pdfview/book/3301 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-03943-846-4 10.3390/books978-3-03943-846-4 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783039438457 9783039438464 106 Basel, Switzerland open access |
| spellingShingle | porous silicon Pd nanoparticles-assisted chemical etching etching rate ethanol electrooxidation X-ray diffractive optics zone plate high aspect ratio nanostructures metal-assisted chemical etching electroless deposition Al2O3 nanotube ultra-high aspect ratio gold (Au) metal assisted chemical etching atomic layer deposition anisotropic dry etching silicon cones metal assisted chemical etching transversal pores antireflection black GaAs photon recycling X-ray grating interferometry catalyst silicon gold electroplating magnetically guided metal-assisted chemical etching bulk Si etching curved Si structure catalyst encapsulation n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technology Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| title | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| title_full | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| title_fullStr | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| title_full_unstemmed | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| title_short | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| title_sort | micro and nano fabrication by metal assisted chemical etching |
| topic | porous silicon Pd nanoparticles-assisted chemical etching etching rate ethanol electrooxidation X-ray diffractive optics zone plate high aspect ratio nanostructures metal-assisted chemical etching electroless deposition Al2O3 nanotube ultra-high aspect ratio gold (Au) metal assisted chemical etching atomic layer deposition anisotropic dry etching silicon cones metal assisted chemical etching transversal pores antireflection black GaAs photon recycling X-ray grating interferometry catalyst silicon gold electroplating magnetically guided metal-assisted chemical etching bulk Si etching curved Si structure catalyst encapsulation n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technology |
| topic_facet | porous silicon Pd nanoparticles-assisted chemical etching etching rate ethanol electrooxidation X-ray diffractive optics zone plate high aspect ratio nanostructures metal-assisted chemical etching electroless deposition Al2O3 nanotube ultra-high aspect ratio gold (Au) metal assisted chemical etching atomic layer deposition anisotropic dry etching silicon cones metal assisted chemical etching transversal pores antireflection black GaAs photon recycling X-ray grating interferometry catalyst silicon gold electroplating magnetically guided metal-assisted chemical etching bulk Si etching curved Si structure catalyst encapsulation n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technology |
| url | ONIX_20210501_9783039438457_35 |