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Advances in Chemical Vapor Deposition

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...

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Wedi'i Gadw mewn:
Fformat: Online
Iaith:Saesneg
Cyhoeddwyd: MDPI - Multidisciplinary Digital Publishing Institute 2021
Pynciau:
APCVD
VO2
processing parameters
2D
chemical vapor deposition
atomic layer deposition
aluminum oxide
aluminum tri-sec-butoxide
thin film
carbon nanotubes
residual gas adsorption
residual gas desorption
field emission
atmospheric pressure CVD
low pressure CVD
hybrid CVD
aerosol assisted CVD
pulsed CVD
perovskite photovoltaic nanomaterials
stabilization
structural design
performance optimization
solar cells
anatase single crystals
process-induced nanostructures
competitive growth
pp-MOCVD
vanadium pentoxide
electrochromic
spray pyrolysis
ammonium metavanadate
CVD
electrochromism
perovskite photovoltaic materials
TiO2
Al2O3
V2O5
computational fluid dynamics
thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues
Mynediad Ar-lein:ONIX_20210501_9783039439232_45
Tagiau: Ychwanegu Tag
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