Advances in Chemical Vapor Deposition
Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...
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| Natura: | Online |
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| Lingua: | inglese |
| Pubblicazione: |
MDPI - Multidisciplinary Digital Publishing Institute
2021
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| Soggetti: | |
| Accesso online: | ONIX_20210501_9783039439232_45 |
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| _version_ | 1869528554048323584 |
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| collection | Directory of Open Access Books |
| description | Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices. |
| format | Online |
| id | doab-20.500.12854ir-68301 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2021 |
| publishDateRange | 2021 |
| publishDateSort | 2021 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-683012024-04-09T23:15:42Z Advances in Chemical Vapor Deposition Vernardou, Dimitra APCVD VO2 processing parameters 2D chemical vapor deposition atomic layer deposition aluminum oxide aluminum tri-sec-butoxide thin film carbon nanotubes residual gas adsorption residual gas desorption field emission atmospheric pressure CVD low pressure CVD hybrid CVD aerosol assisted CVD pulsed CVD perovskite photovoltaic nanomaterials stabilization structural design performance optimization solar cells anatase single crystals process-induced nanostructures competitive growth pp-MOCVD vanadium pentoxide electrochromic spray pyrolysis ammonium metavanadate CVD electrochromism perovskite photovoltaic materials TiO2 Al2O3 V2O5 computational fluid dynamics thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices. 2021-05-01T15:06:30Z 2021-05-01T15:06:30Z 2021 book ONIX_20210501_9783039439232_45 9783039439232 9783039439249 https://directory.doabooks.org/handle/20.500.12854/68301 eng application/octet-stream Attribution 4.0 International https://mdpi.com/books/pdfview/book/3311 https://mdpi.com/books/pdfview/book/3311 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-03943-924-9 10.3390/books978-3-03943-924-9 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783039439232 9783039439249 94 Basel, Switzerland open access |
| spellingShingle | APCVD VO2 processing parameters 2D chemical vapor deposition atomic layer deposition aluminum oxide aluminum tri-sec-butoxide thin film carbon nanotubes residual gas adsorption residual gas desorption field emission atmospheric pressure CVD low pressure CVD hybrid CVD aerosol assisted CVD pulsed CVD perovskite photovoltaic nanomaterials stabilization structural design performance optimization solar cells anatase single crystals process-induced nanostructures competitive growth pp-MOCVD vanadium pentoxide electrochromic spray pyrolysis ammonium metavanadate CVD electrochromism perovskite photovoltaic materials TiO2 Al2O3 V2O5 computational fluid dynamics thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Advances in Chemical Vapor Deposition |
| title | Advances in Chemical Vapor Deposition |
| title_full | Advances in Chemical Vapor Deposition |
| title_fullStr | Advances in Chemical Vapor Deposition |
| title_full_unstemmed | Advances in Chemical Vapor Deposition |
| title_short | Advances in Chemical Vapor Deposition |
| title_sort | advances in chemical vapor deposition |
| topic | APCVD VO2 processing parameters 2D chemical vapor deposition atomic layer deposition aluminum oxide aluminum tri-sec-butoxide thin film carbon nanotubes residual gas adsorption residual gas desorption field emission atmospheric pressure CVD low pressure CVD hybrid CVD aerosol assisted CVD pulsed CVD perovskite photovoltaic nanomaterials stabilization structural design performance optimization solar cells anatase single crystals process-induced nanostructures competitive growth pp-MOCVD vanadium pentoxide electrochromic spray pyrolysis ammonium metavanadate CVD electrochromism perovskite photovoltaic materials TiO2 Al2O3 V2O5 computational fluid dynamics thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | APCVD VO2 processing parameters 2D chemical vapor deposition atomic layer deposition aluminum oxide aluminum tri-sec-butoxide thin film carbon nanotubes residual gas adsorption residual gas desorption field emission atmospheric pressure CVD low pressure CVD hybrid CVD aerosol assisted CVD pulsed CVD perovskite photovoltaic nanomaterials stabilization structural design performance optimization solar cells anatase single crystals process-induced nanostructures competitive growth pp-MOCVD vanadium pentoxide electrochromic spray pyrolysis ammonium metavanadate CVD electrochromism perovskite photovoltaic materials TiO2 Al2O3 V2O5 computational fluid dynamics thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20210501_9783039439232_45 |