Nanoimprint Lithography Technology and Applications
Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around...
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| Format: | Online |
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| Jezik: | angleščina |
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MDPI - Multidisciplinary Digital Publishing Institute
2022
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| Online dostop: | ONIX_20220812_9783036544823_49 |
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| _version_ | 1869529158660390912 |
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| collection | Directory of Open Access Books |
| description | Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting. |
| format | Online |
| id | doab-20.500.12854ir-91170 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2022 |
| publishDateRange | 2022 |
| publishDateSort | 2022 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-911702024-04-09T23:15:45Z Nanoimprint Lithography Technology and Applications Mühlberger, Michael nanoimprint lithography polymer formulation development surface chemistry click chemistry plasmons Bragg SPPs angle of incidence grating organic solar cell ultraviolet nanoimprint lithography durability anisotropy contact angle line and space high aspect ratio micro-structure roll-to-plate nanoimprint lithography superhydrophobic oleophobic biomimetic surface large-area patterning negligible residual layer partial cavity filling guiding chart defect avoidance hydrodynamic instabilities T-NIL UV-NIL el-UV-NIL el-T-NIL optical planar waveguides roll-to-plate R2P nanoimprinting UV-curable polymers inorganic-organic hybrid polymer optical losses SmartNIL R2R UV-NIL neuronal cell assay nanoimprint lithography (NIL) undercut features master Blu-Ray patterning reactive ion etching biomimetics morpho butterfly n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting. 2022-08-12T12:47:16Z 2022-08-12T12:47:16Z 2022 book ONIX_20220812_9783036544823_49 9783036544823 9783036544816 https://directory.doabooks.org/handle/20.500.12854/91170 eng image/jpeg Attribution 4.0 International https://mdpi.com/books/pdfview/book/5815 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-0365-4481-6 10.3390/books978-3-0365-4481-6 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783036544823 9783036544816 180 Basel open access |
| spellingShingle | nanoimprint lithography polymer formulation development surface chemistry click chemistry plasmons Bragg SPPs angle of incidence grating organic solar cell ultraviolet nanoimprint lithography durability anisotropy contact angle line and space high aspect ratio micro-structure roll-to-plate nanoimprint lithography superhydrophobic oleophobic biomimetic surface large-area patterning negligible residual layer partial cavity filling guiding chart defect avoidance hydrodynamic instabilities T-NIL UV-NIL el-UV-NIL el-T-NIL optical planar waveguides roll-to-plate R2P nanoimprinting UV-curable polymers inorganic-organic hybrid polymer optical losses SmartNIL R2R UV-NIL neuronal cell assay nanoimprint lithography (NIL) undercut features master Blu-Ray patterning reactive ion etching biomimetics morpho butterfly n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues Nanoimprint Lithography Technology and Applications |
| title | Nanoimprint Lithography Technology and Applications |
| title_full | Nanoimprint Lithography Technology and Applications |
| title_fullStr | Nanoimprint Lithography Technology and Applications |
| title_full_unstemmed | Nanoimprint Lithography Technology and Applications |
| title_short | Nanoimprint Lithography Technology and Applications |
| title_sort | nanoimprint lithography technology and applications |
| topic | nanoimprint lithography polymer formulation development surface chemistry click chemistry plasmons Bragg SPPs angle of incidence grating organic solar cell ultraviolet nanoimprint lithography durability anisotropy contact angle line and space high aspect ratio micro-structure roll-to-plate nanoimprint lithography superhydrophobic oleophobic biomimetic surface large-area patterning negligible residual layer partial cavity filling guiding chart defect avoidance hydrodynamic instabilities T-NIL UV-NIL el-UV-NIL el-T-NIL optical planar waveguides roll-to-plate R2P nanoimprinting UV-curable polymers inorganic-organic hybrid polymer optical losses SmartNIL R2R UV-NIL neuronal cell assay nanoimprint lithography (NIL) undercut features master Blu-Ray patterning reactive ion etching biomimetics morpho butterfly n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| topic_facet | nanoimprint lithography polymer formulation development surface chemistry click chemistry plasmons Bragg SPPs angle of incidence grating organic solar cell ultraviolet nanoimprint lithography durability anisotropy contact angle line and space high aspect ratio micro-structure roll-to-plate nanoimprint lithography superhydrophobic oleophobic biomimetic surface large-area patterning negligible residual layer partial cavity filling guiding chart defect avoidance hydrodynamic instabilities T-NIL UV-NIL el-UV-NIL el-T-NIL optical planar waveguides roll-to-plate R2P nanoimprinting UV-curable polymers inorganic-organic hybrid polymer optical losses SmartNIL R2R UV-NIL neuronal cell assay nanoimprint lithography (NIL) undercut features master Blu-Ray patterning reactive ion etching biomimetics morpho butterfly n/a thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues |
| url | ONIX_20220812_9783036544823_49 |