Azala

Nanoimprint Lithography Technology and Applications

Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around...

Deskribapen osoa

Gorde:
Formatua: Online
Hizkuntza:ingelesa
Argitaratua: MDPI - Multidisciplinary Digital Publishing Institute 2022
Gaiak:
nanoimprint lithography
polymer
formulation development
surface chemistry
click chemistry
plasmons
Bragg SPPs
angle of incidence
grating
organic solar cell
ultraviolet nanoimprint lithography
durability
anisotropy
contact angle
line and space
high aspect ratio micro-structure
roll-to-plate nanoimprint lithography
superhydrophobic
oleophobic
biomimetic surface
large-area patterning
negligible residual layer
partial cavity filling
guiding chart
defect avoidance
hydrodynamic instabilities
T-NIL
UV-NIL
el-UV-NIL
el-T-NIL
optical planar waveguides
roll-to-plate R2P nanoimprinting
UV-curable polymers
inorganic-organic hybrid polymer
optical losses
SmartNIL
R2R UV-NIL
neuronal cell assay
nanoimprint lithography (NIL)
undercut features
master
Blu-Ray patterning
reactive ion etching
biomimetics
morpho butterfly
n/a
thema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues
Sarrera elektronikoa:ONIX_20220812_9783036544823_49
Etiketak: Etiketa erantsi
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
Izan zaitez lehena ohar bat uzten!
Lehenik saioa ireki behar duzu

Antzeko izenburuak