Atomic Layer Deposition

Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...

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Xehetasun bibliografikoak

Formatua:	Online
Hizkuntza:	ingelesa
Argitaratua:	MDPI - Multidisciplinary Digital Publishing Institute 2021
Gaiak:	thema EDItEUR::G Reference, Information and Interdisciplinary subjects::GP Research and information: general
Sarrera elektronikoa:	ONIX_20210501_9783039366521_619
Etiketak:	Etiketa erantsi Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!