Atomic Layer Deposition

Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...

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Kaydedildi:
Detaylı Bibliyografya
Materyal Türü: Online
Dil:İngilizce
Baskı/Yayın Bilgisi: MDPI - Multidisciplinary Digital Publishing Institute 2021
Konular:
Online Erişim:ONIX_20210501_9783039366521_619
Etiketler: Etiketle
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