Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
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| 格式: | Online |
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| 語言: | 英语 |
| 出版: |
MDPI - Multidisciplinary Digital Publishing Institute
2021
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| 主題: | |
| 在線閱讀: | ONIX_20210501_9783039366521_619 |
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| _version_ | 1869517738003660800 |
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| collection | Directory of Open Access Books |
| description | Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics. |
| format | Online |
| id | doab-20.500.12854ir-68873 |
| institution | Directory of Open Access Books |
| language | eng |
| publishDate | 2021 |
| publishDateRange | 2021 |
| publishDateSort | 2021 |
| publisher | MDPI - Multidisciplinary Digital Publishing Institute |
| publisherStr | MDPI - Multidisciplinary Digital Publishing Institute |
| record_format | ojs |
| spelling | doab-20.500.12854ir-688732024-03-27T16:34:28Z Atomic Layer Deposition Cameron, David thema EDItEUR::G Reference, Information and Interdisciplinary subjects::GP Research and information: general Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics. 2021-05-01T15:31:48Z 2021-05-01T15:31:48Z 2020 book ONIX_20210501_9783039366521_619 9783039366521 9783039366538 https://directory.doabooks.org/handle/20.500.12854/68873 eng application/octet-stream Attribution 4.0 International https://mdpi.com/books/pdfview/book/2640 https://mdpi.com/books/pdfview/book/2640 MDPI - Multidisciplinary Digital Publishing Institute 10.3390/books978-3-03936-653-8 10.3390/books978-3-03936-653-8 46cabcaa-dd94-4bfe-87b4-55023c1b36d0 9783039366521 9783039366538 142 Basel, Switzerland open access |
| spellingShingle | thema EDItEUR::G Reference, Information and Interdisciplinary subjects::GP Research and information: general Atomic Layer Deposition |
| title | Atomic Layer Deposition |
| title_full | Atomic Layer Deposition |
| title_fullStr | Atomic Layer Deposition |
| title_full_unstemmed | Atomic Layer Deposition |
| title_short | Atomic Layer Deposition |
| title_sort | atomic layer deposition |
| topic | thema EDItEUR::G Reference, Information and Interdisciplinary subjects::GP Research and information: general |
| topic_facet | thema EDItEUR::G Reference, Information and Interdisciplinary subjects::GP Research and information: general |
| url | ONIX_20210501_9783039366521_619 |